Mueller matrix imaging of plasmonic polarizers on nanopatterned surface

Lars Martin S. Aas; Ingar Stian Nerbø; Morten Kildemo; Daniele Chiappe; Christian Martella; Francesco Buatier de Mongeot

doi:10.1117/12.889585

27 May 2011 Mueller matrix imaging of plasmonic polarizers on nanopatterned surface

Lars Martin S. Aas, Ingar Stian Nerbø, Morten Kildemo, Daniele Chiappe, Christian Martella, Francesco Buatier de Mongeot

Author Affiliations +

Proceedings Volume 8082, Optical Measurement Systems for Industrial Inspection VII; 80822W (2011) https://doi.org/10.1117/12.889585
Event: SPIE Optical Metrology, 2011, Munich, Germany

Abstract

We present the application of a near infra red Mueller matrix imaging ellipsometer to the characterization of plasmonic polarizers. The samples are prepared by evaporation of Au onto SiO₂ ripples. The nanostructured ripple surface has been produced by ion beam sputtering at an off normal angle of incidence. Au was thereafter evaporated onto the surface at an grazing angle. As a result, thin lines of nearly connected Au nanoparticles form along the illuminated side of the ripples, resulting in a large in-plane anisotropy of the structure. Mueller matrix imaging is used to determine the lateral uniformity of the optical signal in correlation to the real space topography of the sample, and to determine to what degree the nanoparticles tend to form a connected wire, or whether there are well separated Au particles. The success of this method in order to produce polarizers, lies in controlling the process to allow well connected lines of Au particles along the ripples, with a high degree of homogeneity. Mueller Matrix images of the sample recorded at normal incidence are shown, and the information that can be extracted from such images is discussed.

Citation Download Citation

Lars Martin S. Aas, Ingar Stian Nerbø, Morten Kildemo, Daniele Chiappe, Christian Martella, and Francesco Buatier de Mongeot "Mueller matrix imaging of plasmonic polarizers on nanopatterned surface", Proc. SPIE 8082, Optical Measurement Systems for Industrial Inspection VII, 80822W (27 May 2011); https://doi.org/10.1117/12.889585

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available