Advances in DMD-based UV application reliability below 320nm

Jonathan T. Fong; Tom W. Winter; S. Josh Jacobs

doi:10.1117/12.848461

1 April 2010 Advances in DMD-based UV application reliability below 320nm

Jonathan T. Fong, Tom W. Winter, S. Josh Jacobs

Proceedings Volume 7637, Alternative Lithographic Technologies II; 763718 (2010) https://doi.org/10.1117/12.848461
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Texas Instrument's spatial light modulator chip, the DMD (digital micromirror device, the central chip in all DLP based systems) has been used in multiple maskless lithography applications for the past 5-7 years. Typically these applications have been focused on PCB lithography. Applications using illumination below 320nm have not been feasible due to shortened lifetime of the device at shorter wavelengths. Recent advances in DMD processing have made significant improvements in the operational lifetime of the DMD. This paper will cover the background of UV-A DMD maskless lithography and demonstrate the increased lifetime at 311nm and 266nm with the new processes.

Citation Download Citation

Jonathan T. Fong, Tom W. Winter, and S. Josh Jacobs "Advances in DMD-based UV application reliability below 320nm", Proc. SPIE 7637, Alternative Lithographic Technologies II, 763718 (1 April 2010); https://doi.org/10.1117/12.848461

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