Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists

Jeff R. Strahan; Jacob R. Adams; Wei-Lun Jen; Anja Vanleenhove; Colin C. Neikirk; Timothy Rochelle; Roel Gronheid; C. Grant Willson

doi:10.1117/12.813736

1 April 2009 Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists

Jeff R. Strahan, Jacob R. Adams, Wei-Lun Jen, Anja Vanleenhove, Colin C. Neikirk, Timothy Rochelle, Roel Gronheid, C. Grant Willson

Author Affiliations +

Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 72733G (2009) https://doi.org/10.1117/12.813736
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

In an effort to improve upon the sensitivity of commercial non-chemically amplified e-beam resists, four polyacrylates functionalized with α-CF3 and/or CH₂CF₃ alkoxy substituents were studied. The α-CF₃ substituent is known to increase backbone-scission efficiency while simultaneously eliminating acidic out-gassing and cross-linking known to occur in α- halogen substituted polyacrylates. Contrast curves for the polymeric α-CF3 acrylates, generated through e-beam exposure, showed the resists required an order of magnitude less dose than the current industry-standards, PMMA and ZEP. The fundamental sensitivity of these materials to backbone scissioning was determined via ⁶⁰Co γ-ray irradiation. The chain scissioning, G(s), and cross-linking, G(x), values calculated from the resulting change in molecular weight demonstrated that all fluorinated resists possess higher G(s) values than either PMMA or ZEP and have no detectable G(x) values. Utilizing e-beam and EUV interference lithographies, the photospeed of PMTFMA was found to be 2.8x and 4.0x faster, respectively, than PMMA.

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Jeff R. Strahan, Jacob R. Adams, Wei-Lun Jen, Anja Vanleenhove, Colin C. Neikirk, Timothy Rochelle, Roel Gronheid, and C. Grant Willson "Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72733G (1 April 2009); https://doi.org/10.1117/12.813736

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