Low-temperature processing of PZT thin films by 2.45 GHz microwave heating

Z. J. Wang; Y. Otsuka; Z. Cao; M. W. Zhu; N. Yoshikawa; H. Kokawa

doi:10.1117/12.810604

19 December 2008 Low-temperature processing of PZT thin films by 2.45 GHz microwave heating

Z. J. Wang, Y. Otsuka, Z. Cao, M. W. Zhu, N. Yoshikawa, H. Kokawa

Proceedings Volume 7267, Smart Materials V; 726702 (2008) https://doi.org/10.1117/12.810604
Event: SPIE Smart Materials, Nano- and Micro-Smart Systems, 2008, Melbourne, Australia

Abstract

The effect of microwave heating with a frequency of 2.45 GHz on the low-temperature crystallization of Pb(Zr_xTi_1-x)O₃ (PZT) films was investigated. PZT thin films were coated on Pt/Ti/SiO₂/Si substrates by the sol-gel method and then crystallized by single-mode 2.45 GHz microwave irradiation in the magnetic field. The elevated temperature generated by microwave heating used to obtain the perovskite phase was only 450°C, which is significantly lower than that of conventional thermal processing. The PZT films crystallized by microwave heating at 450°C showed similar ferroelectric properties to those of the films crystallized by conventional thermal processing at 600°C. The average remanent polarization and coercive field of the PZT films are approximately 21 µC/cm² and 90 kV/cm, respectively. It is clear that single-mode microwave irradiation in the magnetic field is effective for obtaining perovskite PZT thin films at low temperatures.

Citation Download Citation

Z. J. Wang, Y. Otsuka, Z. Cao, M. W. Zhu, N. Yoshikawa, and H. Kokawa "Low-temperature processing of PZT thin films by 2.45 GHz microwave heating", Proc. SPIE 7267, Smart Materials V, 726702 (19 December 2008); https://doi.org/10.1117/12.810604

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