Design of nano-lithographic system based on phase photon sieve

Wenbo Jiang; Song Hu

doi:10.1117/12.807078

12 January 2009 Design of nano-lithographic system based on phase photon sieve

Wenbo Jiang, Song Hu

Proceedings Volume 7133, Fifth International Symposium on Instrumentation Science and Technology; 71333U (2009) https://doi.org/10.1117/12.807078
Event: International Symposium on Instrumentation Science and Technology, 2008, Shenyang, China

Abstract

A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system performance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.

Citation Download Citation

Wenbo Jiang and Song Hu "Design of nano-lithographic system based on phase photon sieve", Proc. SPIE 7133, Fifth International Symposium on Instrumentation Science and Technology, 71333U (12 January 2009); https://doi.org/10.1117/12.807078

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