The exponential fitting of optical threshold and analyses of testing errors

Dawei Li; Jianda Shao; Yuanan Zhao; Kui Yi; Hongji Qi

doi:10.1117/12.752814

18 December 2007 The exponential fitting of optical threshold and analyses of testing errors

Dawei Li, Jianda Shao, Yuanan Zhao, Kui Yi, Hongji Qi

Proceedings Volume 6720, Laser-Induced Damage in Optical Materials: 2007; 67200B (2007) https://doi.org/10.1117/12.752814
Event: Boulder Damage Symposium XXXIX: Annual Symposium on Optical Materials for High Power Lasers, 2007, Boulder, Colorado, United States

Abstract

The effect of irradiated spot size and number of sites exposed for each pulse energy or power density on damage possibility is studied. It is shown that larger irradiating spot size and more sites tested for each pulse energy or power density, more accurate damage data could be obtained. Also the effect of defect distribution should be taken into account and it also affects the accuracy of damage threshold determination. A new method, exponential fitting, is described and it yields more accurate damage onset. And it is derived from but suitable to more than all-degeneration model.

Citation Download Citation

Dawei Li, Jianda Shao, Yuanan Zhao, Kui Yi, and Hongji Qi "The exponential fitting of optical threshold and analyses of testing errors", Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200B (18 December 2007); https://doi.org/10.1117/12.752814

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