Manufacture and replication of a novel polymer anti-reflective structure

Steve Scott; Marion Gebhardt

doi:10.1117/12.659068

23 January 2006 Manufacture and replication of a novel polymer anti-reflective structure

Steve Scott, Marion Gebhardt

Proceedings Volume 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV; 61100Q (2006) https://doi.org/10.1117/12.659068
Event: MOEMS-MEMS 2006 Micro and Nanofabrication, 2006, San Jose, California, United States

Abstract

A novel manufacturing technique has been developed to make a stochastic antireflective structure into polymer substrates. This paper discusses the production method, test results, and applications for a new antireflective structure, PlasmAR. This capability has enhanced antireflective properties over visible wavelengths when compared with conventional single and multilayer antireflective coatings on polymers.

Citation Download Citation

Steve Scott and Marion Gebhardt "Manufacture and replication of a novel polymer anti-reflective structure", Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 61100Q (23 January 2006); https://doi.org/10.1117/12.659068

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