Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50-nm resolution capability

Kyoko Kojima; Takashi Hattori; Hiroshi Fukuda; Taku Hirayama; Daiju Shiono; Hideo Hada; Junichi Onodera

doi:10.1117/12.656112

29 March 2006 Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50 nm resolution capability

Kyoko Kojima, Takashi Hattori, Hiroshi Fukuda, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera

Author Affiliations +

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61530G (2006) https://doi.org/10.1117/12.656112
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We designed a novel chemically-amplified negative-tone molecular-resist compound of 3M6C-MBSA-BL, which is a γ-hydroxycarboxylated polyphenol (4,4'-methylenebis[2-[di(2-methyl-4-hydroxy-5-cyclohexylphenyl)] methyl]phenol (3M6C-MBSA)) for EB and EUV lithographies to be used in hp 45 and beyond technology nodes. After selection of photo acid generators (PAGs) and optimization of the concentration of PAG in the resist, we could demonstrate 40-nm line and space patterns resolution by EB exposure. Also dry-etching durability and 1-month shelf life at -20^oC were confirmed. Small line-edge roughness (LER) values of 4.5 nm (inspection length: L = 620 nm) and 6.2 nm (L = 1800 nm) were achieved using the 3M6C-MBSA-BL resist.

Citation Download Citation

Kyoko Kojima, Takashi Hattori, Hiroshi Fukuda, Taku Hirayama, Daiju Shiono, Hideo Hada, and Junichi Onodera "Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50 nm resolution capability", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61530G (29 March 2006); https://doi.org/10.1117/12.656112

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