Paper
22 January 2005 Multilayer coating method for x-ray reflectivity enhancement of polysilicon micro-mirrors at 1.54-Å wavelength
Marie K. Tripp, Francois Fabreguette, Cari F. Herrmann, Steven M. George, Victor M. Bright
Author Affiliations +
Abstract
A poly-silicon piston micro-mirror array, which has been enhanced with a multilayer coating to exhibit special reflective properties at Cu Kα emission line of 1.54 Å is presented. The micro-mirror array is fabricated using the MEMSCAP PolyMUMPs process and packaged in a ceramic package. The packaged array is coated using atomic layer deposition with an Al2O3/W multilayer. The first Al2O3 layer is thicker than for a normal bilayer pair and prevents the mirror coating from creating an electrical short. This device was tested before and after coating. The snap-down voltage was reduced by half, but qualitatively the mechanical motion remained similar. The fabrication process presented for the Cu Kα wavelength at 1.54 Å can be easily adapted to other optical MEMS and for other wavelengths.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marie K. Tripp, Francois Fabreguette, Cari F. Herrmann, Steven M. George, and Victor M. Bright "Multilayer coating method for x-ray reflectivity enhancement of polysilicon micro-mirrors at 1.54-Å wavelength", Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); https://doi.org/10.1117/12.590429
Lens.org Logo
CITATIONS
Cited by 8 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Atomic layer deposition

Coating

Micromirrors

Mirrors

Multilayers

Aluminum

Microelectromechanical systems

Back to Top