Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki; Junichi Fujimoto; Taku Yamazaki; Toru Suzuki; Takashi Matsunaga; Yasufumi Kawasuji; Yukio Watanabe; Masashi Kaminishi; Toyoharu Inoue; Hakaru Mizoguchi; Takahito Kumazaki; Tatsuya Ariga; Takayuki Watanabe; Takayuki Yabu; Koutarou Sasano; Tsukasa Hori; Osamu Wakabayashi; Akira Sumitani

doi:10.1117/12.536846

28 May 2004 Development of high-power ArF/F₂ laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.536846
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

New light source technology for ArF lithography under 65nm node is introduced. That is “GigaTwin” platform based on “Injection Lock” technology. The new product named GT40A is 60W (4000Hz, 15mJ), 0.18pm high power ultra narrowed ArF laser. The “Injection Lock” technology provides higher performance and lower CoO. GT40A has enabled the target of more than 60ns pulse duration by natural long pulse and optical pulse stretcher. Combination of “Injection Lock” technology and Gigaphoton’s key technologies; “Higher resolution” technology, “Magnetic bearing” technology and “G-electrode” technology promise durable and reliable performance of GT40A. These technologies enable the target of chamber maintenance interval more than 12 billion pulses. The GT40A will be release into market by 4Q 2004. We introduce latest development data of GT40A, which is developed new high power “Injection Lock” laser platform for VUV/DUV lithography system.

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Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, and Akira Sumitani "Development of high-power ArF/F₂ laser platform for VUV microlithography", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536846

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