Photochemical delineation of waveguides in polymeric thin films

Karl W. Beeson; Keith A. Horn; Christina Lau; Michael J. McFarland; David R. Schwind; James T. Yardley

doi:10.1117/12.50676

1 December 1991 Photochemical delineation of waveguides in polymeric thin films

Karl W. Beeson, Keith A. Horn, Christina Lau, Michael J. McFarland, David R. Schwind, James T. Yardley

Proceedings Volume 1559, Photopolymer Device Physics, Chemistry, and Applications II; (1991) https://doi.org/10.1117/12.50676
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

Polymeric materials that exhibit a controlled change in refractive index upon irradiation with UV light are promising candidates for the development of polymeric optical interconnects. We have demonstrated that polymers containing nitrone functional groups can be spatially patterned for single-mode waveguide devices using both laser direct writing and traditional photolithographic techniques.

Citation Download Citation

Karl W. Beeson, Keith A. Horn, Christina Lau, Michael J. McFarland, David R. Schwind, and James T. Yardley "Photochemical delineation of waveguides in polymeric thin films", Proc. SPIE 1559, Photopolymer Device Physics, Chemistry, and Applications II, (1 December 1991); https://doi.org/10.1117/12.50676

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