Paper
1 March 1991 Real-time automation of a dry etching system
Robert H. McCafferty
Author Affiliations +
Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48927
Event: Processing Integration, 1990, Santa Clara, CA, United States
Abstract
EfForts olthc IBM General I'echno1ogy 1)ivision in Essex Junction, Vermont to automate the investigation of dry etching processes employed in the manufacture of semiconductor memory chips are described. This paper overviews the technical case for the project, then proceeds to qualitatively detail the control strategy and installation ground rules, as well as the project's data processing and signal conditioning equipment, tool and process instrumentation, and driving software. The architecture and performance of the resulting system are then discussed. Further, the technical conclusions and implications of this system's success are presented.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert H. McCafferty "Real-time automation of a dry etching system", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); https://doi.org/10.1117/12.48927
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KEYWORDS
Etching

Control systems

Manufacturing

Process control

Dry etching

Integrated circuits

Electrodes

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