Evaluating the resolution of a CD-SEM

Ira J. Rosenberg

doi:10.1117/12.473472

16 July 2002 Evaluating the resolution of a CD-SEM

Ira J. Rosenberg

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473472
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Traditionally, CD-SEM resolution has been measured using edge and spacing measurements, where images are subjectively examined and evaluated as to edge transition width between arbitrary amplitudes or minimum measurable spacings between particles. Occasionally, methods form traditional optics, i.e., application of the Rayleigh criterion, have been quoted, but the more conservative results have caused users either to relax these traditional definitions or to abandon them altogether. More recently, as in light optics, Fourier methods, where frequency space results are used to define the resolution of the system, have been applied. In this paper, these methods are surveyed and applied to experimental data. In particular, Fourier transform approaches are examined, and the difficulties in their application vis-a-vis separation signal from noise, maintaining repeatability, and eliminating system and processing artifacts addressed. A method based on the Rayleigh criterion for diffraction limited systems is proposed that minimizes these difficulties by processing out system effects and distancing the evaluation region form both the noise and system artifacts. This method has the particular advantage of not requiring operator intervention, ensuring consistent results form user to user.

Citation Download Citation

Ira J. Rosenberg "Evaluating the resolution of a CD-SEM", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473472

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