Electron beam lithographic fabrication of computer-generated holograms

Andrew A. West; Robin W. Smith

doi:10.1117/12.47039

1 September 1991 Electron beam lithographic fabrication of computer-generated holograms

Andrew A. West, Robin W. Smith

Proceedings Volume 1507, Holographic Optics III: Principles and Applications; (1991) https://doi.org/10.1117/12.47039
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands

Abstract

The fabrication of a range of computer-generated holographic optical elements by means of electron beam lithography is described. These elements can be considered as the combination of two overlapped cylindrical diffractive optical elements of the same focal length. The imaging properties of both orthogonal and non-orthogonal combinations are discussed. These elements produce sets of line foci at different distances and orientations determined by the angle between the two cylindrical elements. The detailed features of the line foci, 'macro- and micro-beading' can be related to the structure of the combined gratings. Equations identifying the locations of the foci are presented, and these suggest a distance measuring technique which might be applicable to machine vision.

Citation Download Citation

Andrew A. West and Robin W. Smith "Electron beam lithographic fabrication of computer-generated holograms", Proc. SPIE 1507, Holographic Optics III: Principles and Applications, (1 September 1991); https://doi.org/10.1117/12.47039

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