Investigation of EUV sources for 13.5-nm operation

Grainne Duffy; Anthony Cummings; Padraig Dunne; Gerard D. O'Sullivan

doi:10.1117/12.463649

27 August 2003 Investigation of EUV sources for 13.5-nm operation

Grainne Duffy, Anthony Cummings, Padraig Dunne, Gerard D. O'Sullivan

Proceedings Volume 4876, Opto-Ireland 2002: Optics and Photonics Technologies and Applications; (2003) https://doi.org/10.1117/12.463649
Event: OPTO Ireland, 2002, Galway, Ireland

Abstract

The internationally agreed semiconductor roadmap calls for the development of bright, narrow bandwidth sources of extreme UV radiation for lithography at 13.5 nm. Both pulsed discharge sources and laser produced plasmas have been proposed as possible candidates and xenon is currently the most favored constituent element since it possesses strong emission lines at the correct wavelength. In this paper we show from theoretical considerations that tin containing plasmas provide superior intesitiy, albeit at the expense of increased debris emission. We also show that for laser produced plasma sources, the brightness can be considerably enhanced by varying both the target constituents and the laser pulse profile. Various methods by which the debris problem might be reduced are discussed.

Citation Download Citation

Grainne Duffy, Anthony Cummings, Padraig Dunne, and Gerard D. O'Sullivan "Investigation of EUV sources for 13.5-nm operation", Proc. SPIE 4876, Opto-Ireland 2002: Optics and Photonics Technologies and Applications, (27 August 2003); https://doi.org/10.1117/12.463649

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