Multispot scanning exposure system for excimer laser stepper

Yasuhiro Yoshitake; Yoshitada Oshida; Tetsuzou Tanimoto; Minoru Tanaka; Minoru Yoshida

doi:10.1117/12.44823

1 July 1991 Multispot scanning exposure system for excimer laser stepper

Yasuhiro Yoshitake, Yoshitada Oshida, Tetsuzou Tanimoto, Minoru Tanaka, Minoru Yoshida

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44823
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A new type of spot scanning exposure system has been developed for an excimer laser stepper. To optimize exposure parameters, the authors developed a SIPSE (Simulator for Spot Scanning Exposure) and performed experiments with a He-Cd laser and a g-line lens. Applying the results, a prototype of an excimer laser exposure system was developed. A lens evaluation system has also been developed to adjust the lens elements in the projection lens. Using these systems, 0.35 micron line and space patterns were clearly resolved. SIPSE will be usable to optimize a phase-shifting exposure system with a potential for 0.25 micron patterns.

Citation Download Citation

Yasuhiro Yoshitake, Yoshitada Oshida, Tetsuzou Tanimoto, Minoru Tanaka, and Minoru Yoshida "Multispot scanning exposure system for excimer laser stepper", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44823

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