Micromachined tunable rf capacitor with comb structure

Yufeng Jin; Haixia Zhang; Min Miao; Kun Tang; Zhihong Li

doi:10.1117/12.444745

15 October 2001 Micromachined tunable rf capacitor with comb structure

Yufeng Jin, Haixia Zhang, Min Miao, Kun Tang, Zhihong Li

Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001) https://doi.org/10.1117/12.444745
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China

Abstract

A micromachined tunable RF capacitor with interdigitated comb plate structure is investigated in this paper. Much effort to improve tuning ratio, such as minimizing parasitical capacitance, is presented. Analysis shows the bias voltage can be lowered through the optimization of the structure parameters. Also presented is the fabrication of this capacitor based on typical bulk silicon micromachining technology.

Citation Download Citation

Yufeng Jin, Haixia Zhang, Min Miao, Kun Tang, and Zhihong Li "Micromachined tunable rf capacitor with comb structure", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); https://doi.org/10.1117/12.444745

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