Simulation of optical lithography from distorted photomasks

Zheng Cui; Jinglei Du; Yangsu Zheng; Yongkang Guo

doi:10.1117/12.435689

14 September 2001 Simulation of optical lithography from distorted photomasks

Zheng Cui, Jinglei Du, Yangsu Zheng, Yongkang Guo

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435689
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Simulation of photomask patterning process and optical lithography at wafer level has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulations which were based on ideal mask designs, the optical lithography simulation presented in this paper is based on distorted masks. The distorted mask comes from electron beam lithography simulation or laser direct write simulation. Proximity effects in e-beam lithography or laser direct write has been taken into account. The results have shown that optical proximity effect is worsened if a distorted mask is used in the optical lithography simulation, instead of an ideal mask.

Citation Download Citation

Zheng Cui, Jinglei Du, Yangsu Zheng, and Yongkang Guo "Simulation of optical lithography from distorted photomasks", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435689

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