Optical properties of thin films deposited by reactive-Rf-magnetron sputtering

Kunio Yoshida; Tomosumi Kamimura; Kanyoshi Ochi; Schukichi Kaku; Hidetsugu Yoshida; Hisanori Fujita; F. Tani; M. Sunagawa; Takayuki Okamoto

doi:10.1117/12.274285

13 May 1997 Optical properties of thin films deposited by reactive-Rf-magnetron sputtering

Kunio Yoshida, Tomosumi Kamimura, Kanyoshi Ochi, Schukichi Kaku, Hidetsugu Yoshida, Hisanori Fujita, F. Tani, M. Sunagawa, Takayuki Okamoto

Author Affiliations +

Proceedings Volume 2966, Laser-Induced Damage in Optical Materials: 1996; (1997) https://doi.org/10.1117/12.274285
Event: Laser-Induced Damage in Optical Materials: 1996, 1996, Boulder, CO, United States

Abstract

Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate, and the change of spectral characteristics and film stress in the relative humidity. Thin films coated by reactive-rf-magnetron sputtering improve these problems. In this paper, optical properties of thin films deposited by reactive-rf-magnetron sputtering are presented.

Citation Download Citation

Kunio Yoshida, Tomosumi Kamimura, Kanyoshi Ochi, Schukichi Kaku, Hidetsugu Yoshida, Hisanori Fujita, F. Tani, M. Sunagawa, and Takayuki Okamoto "Optical properties of thin films deposited by reactive-Rf-magnetron sputtering", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274285

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