Block co-polymers for etch mask definition to create anti-reflective surfaces

Brian D. Jennings; Riley Gatensby; Elsa Giraud; Andrew Selkirk; Sajjad H. Mir; Ramsankar Senthamaraikannan; Parvaneh Mokarian-Tabari

doi:10.1117/12.2568487

20 August 2020 Block co-polymers for etch mask definition to create anti-reflective surfaces

Brian D. Jennings, Riley Gatensby, Elsa Giraud, Andrew Selkirk, Sajjad H. Mir, Ramsankar Senthamaraikannan, Parvaneh Mokarian-Tabari

Author Affiliations +

Proceedings Volume 11467, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII; 1146727 (2020) https://doi.org/10.1117/12.2568487
Event: SPIE Nanoscience + Engineering, 2020, Online Only

Conference Poster

Abstract

Block co-polymers (BCPs) enable large-scale patterning with nanoscale feature sizes. With high molecular weight BCPs, features and periods in the range 50 nm to 150 nm can be achieved. This feature size lends itself to sub-diffractive visible and near-infrared optical components. In this work, BCPs are used to form a triangular lattice on a glass surface; the lattice is selectively infiltrated with nickel oxide to produce a mask for plasma etching. The conical pillars formed by etching generate a gradual change of refractive index thus reducing the reflectivity of the glass surface over a broad range of wavelengths and angles.

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Brian D. Jennings, Riley Gatensby, Elsa Giraud, Andrew Selkirk, Sajjad H. Mir, Ramsankar Senthamaraikannan, and Parvaneh Mokarian-Tabari "Block co-polymers for etch mask definition to create anti-reflective surfaces", Proc. SPIE 11467, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII, 1146727 (20 August 2020); https://doi.org/10.1117/12.2568487

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