Damage resistant optical coatings prepared using high temperature, plasma chemical-vapor-deposition

J. H. Campbell

doi:10.1117/12.2294452

1 November 1990 Damage resistant optical coatings prepared using high temperature, plasma chemical-vapor-deposition

J. H. Campbell

Proceedings Volume 1438, Laser-Induced Damage in Optical Materials 1989; 143817 (1990) https://doi.org/10.1117/12.2294452
Event: Laser-Induced Damage in Optical Materials 1989, 1989, Boulder, CO, United States

Abstract

Multilayer dielectric optical coatings, nominally consisting of 1000 or more optical-quarterwave layers, have been prepared by reacting SiC14 and a halogenated dopant (e.g. GeCl4) with 02 in a microwave-driven plasma. The dopant concentration is such that the index difference (An) between adjacent quarterwave layers is about 0.02 or less. The deposition is carried out at high substrate temperatures (850 to 1100Ã‚Â°C) producing a fully dense, fused silica coating. Surface damage thresholds of high reflectivity (HR) coatings prepared by this plasma process are comparable to those for fused silica. For example, at 1.06 p.m and 16-ns we measure surface damage thresholds greater than 45 J/cm2 compared to about 45-60 J/cm2 for super-polished optical fused silica.

Citation Download Citation

J. H. Campbell "Damage resistant optical coatings prepared using high temperature, plasma chemical-vapor-deposition", Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143817 (1 November 1990); https://doi.org/10.1117/12.2294452

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