Optical and structural characterization of Nb, Zr, Nb/Zr, Zr/Nb thin films on Si3N4 membranes windows

K. Jimenez; A. E. H. Gaballah; Nadeem Ahmed; P. Zuppella; P. Nicolosi

doi:10.1117/12.2267348

15 May 2017 Optical and structural characterization of Nb, Zr, Nb/Zr, Zr/Nb thin films on Si₃N₄ membranes windows

K. Jimenez, A. E. H. Gaballah, Nadeem Ahmed, P. Zuppella, P. Nicolosi

Proceedings Volume 10236, Damage to VUV, EUV, and X-ray Optics VI; 102360K (2017) https://doi.org/10.1117/12.2267348
Event: SPIE Optics + Optoelectronics, 2017, Prague, Czech Republic

Abstract

High brilliance sources in the EUV spectral range such as Synchrotron and Free Electron Lasers (FEL) are widely used in multiple scientific and technological applications thanks to their peculiar characteristics. One main technical problem of FEL is related to the rejection of high harmonics, seed laser, first stage photons, and diffuse light; in order to improve the quality of the beam delivered by these sources, a suitable optical system acting as band-pass filters is necessary. In this paper we discuss the optical and structure characterization of Nb/Zr and Zr/Nb self-stand transmittance filters, designed for 4.5 nm-20 nm wavelength ranges. In order to understand the properties of these bilayers filters, a campaign of measurements has been planned to be performed on Zr and Nb films on Si₃N₄ membrane windows and silicon substrates, deposited with e- beam deposition technique. Comparison of the results has been planned too. IMD transmittance and reflectance simulations, together with preliminary AFM and reflectance measurements will be shown in this work.

Citation Download Citation

K. Jimenez, A. E. H. Gaballah, Nadeem Ahmed, P. Zuppella, and P. Nicolosi "Optical and structural characterization of Nb, Zr, Nb/Zr, Zr/Nb thin films on Si₃N₄ membranes windows", Proc. SPIE 10236, Damage to VUV, EUV, and X-ray Optics VI, 102360K (15 May 2017); https://doi.org/10.1117/12.2267348

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