Molecular glass resist performance for nano-pattern transfer

Ziad el Otell; Andreas Ringk; Tristan Kolb; Christian Neuber; Leander Hansel; Jean-François de Marneffe

doi:10.1117/12.2085828

17 March 2015 Molecular glass resist performance for nano-pattern transfer

Ziad el Otell, Andreas Ringk, Tristan Kolb, Christian Neuber, Leander Hansel, Jean-François de Marneffe

Proceedings Volume 9428, Advanced Etch Technology for Nanopatterning IV; 94280J (2015) https://doi.org/10.1117/12.2085828
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The performance of novel molecular glass resists is demonstrated in this work for the purposes of performing nano-pattern transfer. In order to improve the etch durability, post apply bake (PAB) and mixing two resists platforms were investigated. These resists showed a promising etch durability for efficient pattern transfer with films as thin as 5 nm. Etch rate, surface roughness, evolution of the refractive index of these materials are presented to establish a good baseline and select appropriate candidate materials for patterning beyond-CMOS.

Citation Download Citation

Ziad el Otell, Andreas Ringk, Tristan Kolb, Christian Neuber, Leander Hansel, and Jean-François de Marneffe "Molecular glass resist performance for nano-pattern transfer", Proc. SPIE 9428, Advanced Etch Technology for Nanopatterning IV, 94280J (17 March 2015); https://doi.org/10.1117/12.2085828

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