Studying the mechanism of hybrid nanoparticle EUV photoresists

Ben Zhang; Li Li; Jing Jiang; Mark Neisser; Jun Sung Chun; Christopher K. Ober; Emmanuel P. Giannelis

doi:10.1117/12.2085662

20 March 2015 Studying the mechanism of hybrid nanoparticle EUV photoresists

Ben Zhang, Li Li, Jing Jiang, Mark Neisser, Jun Sung Chun, Christopher K. Ober, Emmanuel P. Giannelis

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 94251E (2015) https://doi.org/10.1117/12.2085662
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO₂) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential.

Citation Download Citation

Ben Zhang, Li Li, Jing Jiang, Mark Neisser, Jun Sung Chun, Christopher K. Ober, and Emmanuel P. Giannelis "Studying the mechanism of hybrid nanoparticle EUV photoresists", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251E (20 March 2015); https://doi.org/10.1117/12.2085662

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