Dopant-Pair Structures Segregated on a Hydrogen-Terminated Si(100) Surface

Yuji Suwa, S. Matsuura, M. Fujimori, S. Heike, T. Onogi, H. Kajiyama, T. Hitosugi, K. Kitazawa, T. Uda, and T. Hashizume
Phys. Rev. Lett. 90, 156101 – Published 14 April 2003

Abstract

Novel atomic structures on a H-terminated Si(100)-(2×1)-H surface were found using scanning tunneling microscopy (STM). The structures are distinguishable only from Si dimers in empty-state STM images. They were observed on arsenic- and phosphorus-doped substrates, but not on boron-doped substrates. Surface density of these structures was found to be proportional to the dopant density in the substrate. First-principles calculations clarify that they are consisting of dopant pairs that are segregated from the bulk material. Hydrogen atoms attached to the dopant pair are found to flip between two positions on the surface due to a quantum effect.

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  • Received 13 September 2002

DOI:https://doi.org/10.1103/PhysRevLett.90.156101

©2003 American Physical Society

Authors & Affiliations

Yuji Suwa1, S. Matsuura2, M. Fujimori3, S. Heike3, T. Onogi3, H. Kajiyama3, T. Hitosugi2, K. Kitazawa2, T. Uda1, and T. Hashizume3

  • 1Advanced Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
  • 2Department of Superconductivity, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 3Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama 350-0395, Japan

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Issue

Vol. 90, Iss. 15 — 18 April 2003

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