Anomalous Impurity Segregation and Local Bonding Fluctuation in l-Si

G. Fisicaro, K. Huet, R. Negru, M. Hackenberg, P. Pichler, N. Taleb, and A. La Magna
Phys. Rev. Lett. 110, 117801 – Published 13 March 2013

Abstract

Anomalous impurity redistribution after a laser irradiation process in group-IV elements has been reported in numerous papers. In this Letter, we correlate this still unexplained behavior with the peculiar bonding character of the liquid state of group-IV semiconductors. Analyzing the B-Si system in a wide range of experimental conditions we demonstrate that this phenomenon derives from the non-Fickian diffusion transport of B in lSi. The proposed diffusion model relies on the balance between two impurity states in different bonding configurations: one migrating at higher diffusivity than the other. This microscopic mechanism explains the anomalous B segregation, whereas accurate comparisons between experimental chemical profiles and simulation results validate the model.

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  • Received 12 September 2012

DOI:https://doi.org/10.1103/PhysRevLett.110.117801

© 2013 American Physical Society

Authors & Affiliations

G. Fisicaro1,*, K. Huet2, R. Negru2, M. Hackenberg3, P. Pichler3,4, N. Taleb5, and A. La Magna1

  • 1CNR IMM, Z.I. VIII Strada 5, I -95121 Catania, Italy
  • 2Excico 13-21 Quai des Gresillons, 92230 Gennevilliers, France
  • 3Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany
  • 4Chair of Electron Devices, University of Erlangen-Nuremberg, Cauerstrasse 6, 91058 Erlangen, Germany
  • 5Probion, 37 Rue de Fontenay, 92220 Bagneux, France

  • *giuseppe.fisicaro@imm.cnr.it

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Vol. 110, Iss. 11 — 15 March 2013

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