Negative ion formation and motion in a mixture of CCl4 and Ar

F. B. Yousif and H. Martínez
Phys. Rev. E 69, 046401 – Published 14 April 2004
PDFExport Citation

Abstract

This paper deals with the measurement of the mobility of negative ions in the mixtures of CCl4 with Ar with the CCl4 ratio up to 33.3%. The pulsed Townsend technique was employed to produce an integrated ionic avalanche over a range of the density-reduced electric field E/N for which ionization is either negligible or absent, and attachment processes are dominant, leading to the formation of mostly CCl4. The E/N range of measurement was 1–50 Td (1Td=1017Vcm2). Our measurements strongly suggest that attachment is the dominant process and only negative ions are formed.

  • Received 13 November 2003

DOI:https://doi.org/10.1103/PhysRevE.69.046401

©2004 American Physical Society

Authors & Affiliations

F. B. Yousif1,* and H. Martínez2

  • 1Facultad de Ciencias, Universidad Autonoma del Estado de Morelos, Avenida, Universidad 1001, Colonia Chamilpa, Codigo Postal 62210 Cuernavaca, Morelos, Mexico
  • 2Centro de Ciencias Físicas, Universidad Nacional Autónoma de México, Cuernavaca, Morelos, P.O. Box 48-3, 62251 Cuernavaca, Morelos, Mexico

  • *Electronic address: fbyousif@servm.fc.uaem.mx

References (Subscription Required)

Click to Expand
Issue

Vol. 69, Iss. 4 — April 2004

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review E

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×