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Thickness dependence of the structure and magnetization of BiFeO3 thin films on (LaAlO3)0.3(Sr2AlTaO6)0.7 (001) substrate

D. S. Rana, K. Takahashi, K. R. Mavani, I. Kawayama, H. Murakami, M. Tonouchi, T. Yanagida, H. Tanaka, and T. Kawai
Phys. Rev. B 75, 060405(R) – Published 7 February 2007

Abstract

The structural dependence of magnetization in BiFeO3 thin films deposited on (LaAlO3)0.3(Sr2AlTaO6)0.7 (001) substrate has been investigated in the film thickness (t) range of 40500nm. High-resolution x-ray-diffraction studies reveal a thickness dependent structural transition from a fully strained tetragonal phase for films with t75nm to a partially strained and/or relaxed rhombohedral phase in films thicker than 110nm, via a coexistence of fully and partially strained phases in the thickness of 75>t>110nm. The fully strained phase could also be partially induced in 110nm films by increasing the post-deposition O2 annealing pressure. The films 110nm were found to possess a thickness independent bulklike magnetic moment. A weak enhancement in magnetic moment (up to 0.1μB) is observed in fully strained films (t75nm) and in excessive O2-annealed 110nm films having a fraction of strained phase. These results suggest that by a considerably weak magnetic moment in the pseudomorphic strained phase arises from the epitaxial strain induced canted antiferromagnetic structure. This study resolves a much debated issue of strain induced magnetic moment in BiFeO3 thin films.

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  • Received 21 September 2006

DOI:https://doi.org/10.1103/PhysRevB.75.060405

©2007 American Physical Society

Authors & Affiliations

D. S. Rana, K. Takahashi, K. R. Mavani, I. Kawayama, H. Murakami, and M. Tonouchi

  • Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Suita, Osaka 565-0871, Japan

T. Yanagida, H. Tanaka, and T. Kawai

  • Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

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Issue

Vol. 75, Iss. 6 — 1 February 2007

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