Structural TEM study of nonpolar a-plane gallium nitride grown on (112¯0)4H-SiC by organometallic vapor phase epitaxy

Dmitri N. Zakharov, Zuzanna Liliental-Weber, Brian Wagner, Zachary J. Reitmeier, Edward A. Preble, and Robert F. Davis
Phys. Rev. B 71, 235334 – Published 30 June 2005

Abstract

Conventional and high-resolution electron microscopy have been applied for studying lattice defects in nonpolar a-plane GaN grown on a 4H-SiC substrate with an AlN buffer layer. Samples in plan-view and cross-sectional configurations have been investigated. Basal and prismatic stacking faults together with Frank and Shockley partial dislocations were found to be the main defects in the GaN layers. High-resolution electron microscopy in combination with image simulation supported Drum’s model for the prismatic stacking faults. The density of basal stacking faults was measured to be 1.6×106cm1. The densities of partial dislocations terminating I1 and I2 types of intrinsic basal stacking faults were 4.0×1010cm2 and 0.4×1010cm2, respectively. The energy of the I2 stacking fault in GaN was estimated to be (40±4)ergcm2 based on the separation of Shockley partial dislocations.

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  • Received 21 June 2004

DOI:https://doi.org/10.1103/PhysRevB.71.235334

©2005 American Physical Society

Authors & Affiliations

Dmitri N. Zakharov* and Zuzanna Liliental-Weber

  • Materials Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Mail Stop 62-203, Berkeley, California 94720-8253, USA

Brian Wagner, Zachary J. Reitmeier, Edward A. Preble, and Robert F. Davis

  • Materials Science and Engineering Department, North Carolina State University, 2401 Stinson Drive, Raleigh, North Carolina 27695-7907, USA

  • *Correspondence author; Email: dnzakharov@lbl.gov

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Issue

Vol. 71, Iss. 23 — 15 June 2005

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