Abstract
Conventional and high-resolution electron microscopy have been applied for studying lattice defects in nonpolar -plane GaN grown on a -SiC substrate with an AlN buffer layer. Samples in plan-view and cross-sectional configurations have been investigated. Basal and prismatic stacking faults together with Frank and Shockley partial dislocations were found to be the main defects in the GaN layers. High-resolution electron microscopy in combination with image simulation supported Drum’s model for the prismatic stacking faults. The density of basal stacking faults was measured to be . The densities of partial dislocations terminating and types of intrinsic basal stacking faults were and , respectively. The energy of the stacking fault in GaN was estimated to be based on the separation of Shockley partial dislocations.
4 More- Received 21 June 2004
DOI:https://doi.org/10.1103/PhysRevB.71.235334
©2005 American Physical Society