Abstract
The dielectric properties of 〈100〉-oriented epitaxial films as used in high- heterostructures have been studied as a function of temperature and applied electric field by using in situ grown heterostructures (Mg//:Nb and Au///:Nb). The dielectric behavior of these films is characterized by a rather low sample capacitance as compared to bulk single-crystal values and by occurrences of maxima in the capacitance-voltage and capacitance-temperature curves. The maximum attainable polarization was found to be 80 mC/ at 4.2 K. Complementary measurements on single crystals of and :Nb reveal that the behavior of these thin films can be understood from the bulk properties with additional strong charge trapping at the film-substrate interface.
- Received 8 November 1993
DOI:https://doi.org/10.1103/PhysRevB.49.12095
©1994 American Physical Society