Inelastic scattering of electrons from accumulation and inversion layers

B. N. J. Persson, J. G. Ping, Y. B. Xu, D. Frankel, Y. Chen, and G. J. Lapeyre
Phys. Rev. B 40, 7819 – Published 15 October 1989
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Abstract

We derive a simple formula for the width of the quasielastic peak in inelastic electron scattering from accumulation and inversion layers at semiconductor surfaces. As an application, it is shown that for the (2×1) reconstructed Ge(111) surface, the Fermi level (at room temperature) is pinned 140 meV above the surface valence-band edge (Evs). This result differs from the prevailing opinion that the pinning occurs right at Evs. For temperatures T<300 K, the pinning position varies linearly with temperature in such a way that the pinning occurs at Evs at T=0 K.

  • Received 6 June 1989

DOI:https://doi.org/10.1103/PhysRevB.40.7819

©1989 American Physical Society

Authors & Affiliations

B. N. J. Persson and J. G. Ping

  • Institut für Festkörperforschung, Kernforschungsanlage Jülich GmbH, Postfach 1913, D-5170 Jülich 1, West Germany

Y. B. Xu, D. Frankel, Y. Chen, and G. J. Lapeyre

  • Department of Physics, Montana State University, Bozeman, Montana 59717

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Vol. 40, Iss. 11 — 15 October 1989

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