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Photoemission spectroscopy of ultrathin hydrogenated amorphous silicon layers

L. Yang, B. Abeles, W. Eberhardt, H. Stasiewski, and D. Sondericker
Phys. Rev. B 35, 9395(R) – Published 15 June 1987
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Abstract

Photoemission spectroscopy of ultrathin hydrogenated amorphous silicon films on silicon oxide show that the interfaces are atomically abrupt. The Si 3p valence band is already developed in monolayer-thick islands. The absence of quantum-size effects associated with holes indicates that the Si 3p wave functions are localized on a scale of a few angstroms. The range of the Si 2p core-holeexciton interaction is estimated to be 6 Å.

  • Received 29 December 1986

DOI:https://doi.org/10.1103/PhysRevB.35.9395

©1987 American Physical Society

Authors & Affiliations

L. Yang, B. Abeles, W. Eberhardt, and H. Stasiewski

  • Exxon Research and Engineering Company, Annandale, New Jersey 08801

D. Sondericker

  • Brookhaven National Laboratory, Upton, New York, 11973

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Issue

Vol. 35, Iss. 17 — 15 June 1987

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