Bias-Dependent Generation and Quenching of Defects in Pentacene

D. V. Lang, X. Chi, T. Siegrist, A. M. Sergent, and A. P. Ramirez
Phys. Rev. Lett. 93, 076601 – Published 13 August 2004

Abstract

We describe a defect generation phenomenon that is new to organic semiconductors. A defect in pentacene single crystals can be created by bias-stress and persists at room temperature for an hour in the dark but only seconds with 420 nm illumination. The defect gives rise to a hole trap at Ev+0.38   eV and causes metastable transport effects at room temperature. Creation and decay rates of the hole trap have a 0.67 eV activation energy with a small (108   s1) prefactor, suggesting that atomic motion plays a key role in the generation and quenching process.

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  • Received 17 December 2003

DOI:https://doi.org/10.1103/PhysRevLett.93.076601

©2004 American Physical Society

Authors & Affiliations

D. V. Lang1,2, X. Chi2, T. Siegrist3, A. M. Sergent3, and A. P. Ramirez3,2

  • 1Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA
  • 2Columbia University, New York, New York 10027, USA
  • 3Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Murray Hill, New Jersey 07974, USA

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Issue

Vol. 93, Iss. 7 — 13 August 2004

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