Complexity of the hot carrier relaxation in Si nanowires compared to bulk

Jing Li, Yann-Michel Niquet, and Christophe Delerue
Phys. Rev. B 95, 205401 – Published 1 May 2017

Abstract

We investigate the relaxation of hot carriers by emission of phonons in bulk Si and Si nanowires (NWs) with an identical atomistic methodology. The phonon scattering is strongly enhanced in NWs. At high excitation energy, the carrier cooling is faster in NWs than in bulk, mainly due to the coupling to surface phonons. Slow relaxation is only noticed for electrons at low energy in the conduction band of thin NWs due to the quantum confinement that lifts the degeneracy of the valleys. This work gives insight into the complexity of the carrier cooling in semiconductor nanostructures.

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  • Received 25 January 2017
  • Revised 5 April 2017

DOI:https://doi.org/10.1103/PhysRevB.95.205401

©2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jing Li1,*, Yann-Michel Niquet2,†, and Christophe Delerue3,‡

  • 1Université Grenoble Alpes, CNRS, Institut Néel, F-38042 Grenoble, France
  • 2CEA, INAC-MEM, L_Sim, F-38000 Grenoble, France and Université Grenoble Alpes, INAC-MEM, L_Sim, F-38000 Grenoble, France
  • 3Université Lille, CNRS, Centrale Lille, ISEN, Université Valenciennes, UMR 8520 - IEMN, F-59000 Lille, France

  • *jing.li.phy@gmail.com
  • yniquet@cea.fr
  • christophe.delerue@iemn.univ-lille1.fr

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Issue

Vol. 95, Iss. 20 — 15 May 2017

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