Stability and electronic properties of two-dimensional indium iodide

Jizhang Wang, Baojuan Dong, Huaihong Guo, Teng Yang, Zhen Zhu, Gan Hu, Riichiro Saito, and Zhidong Zhang
Phys. Rev. B 95, 045404 – Published 3 January 2017

Abstract

Based on ab initio density functional calculations, we studied the stability and electronic properties of two-dimensional indium iodide (InI). The calculated results show that monolayer and few-layer InI can be as stable as its bulk counterpart. The stability of the monolayer structure is further supported by examining the electronic and dynamic stability. The interlayer interaction is found to be fairly weak (160 meV/atom) and mechanical exfoliation to obtain monolayer and few-layer structures will be applicable. A direct band gap of 1.88 eV of the bulk structure is obtained from the hybrid functional method, and is comparable to the experimental one (2.00 eV). The electronic structure can be tuned by layer stacking and external strain. The size of the gap is a linear function of an inverse number of layers, suggesting that we can design few-layer structures for optoelectronic applications in the visible optical range. In-plane tensile or hydrostatic compressive stress is found to be useful not only in varying the gap size to cover the whole visible optical range, but also in inducing a semiconductor-metal transition with an experimentally accessible stress. The present result strongly supports the strategy of broadening the scope of group-V semiconductors by looking for isoelectronic III-VII atomic-layered materials.

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  • Received 6 October 2016

DOI:https://doi.org/10.1103/PhysRevB.95.045404

©2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jizhang Wang1, Baojuan Dong1, Huaihong Guo2,3, Teng Yang1,3,*, Zhen Zhu4,5, Gan Hu1, Riichiro Saito3, and Zhidong Zhang1

  • 1Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, School of Materials Science and Engineering, University of Science and Technology of China, Shenyang 110016, China
  • 2College of Sciences, Liaoning Shihua University, Fushun 113001, China
  • 3Department of Physics, Tohoku University, Sendai 980-8578, Japan
  • 4Physics and Astronomy Department, Michigan State University, East Lansing, Michigan 48824, USA
  • 5Materials Department, University of California, Santa Barbara, California 93106-5050, USA

  • *yangteng@imr.ac.cn

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Vol. 95, Iss. 4 — 15 January 2017

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