Abstract
The thermal stability and electronic transport properties of polyamorphous metallic glass (MG) have been investigated using in situ high-pressure, high-temperature, energy-dispersive synchrotron x-ray diffraction and in situ high-pressure and low-temperature, four-probe resistance measurements. The results are compared with the properties of MG. The pressure dependence of the crystallization temperature and resistance of the MG exhibited turning points at the polyamorphic transition pressure, 1.5 GPa, and they clearly presented different behaviors below and above 1.5 GPa. In contrast, no turning points were observed in the MG (La has no electron). Additionally, the pressure-tuned temperature coefficient of resistance of the MG was observed. These results revealed switchable properties in the polyamorphous MG that are linked with electron delocalization.
- Received 1 May 2010
DOI:https://doi.org/10.1103/PhysRevB.82.054111
©2010 American Physical Society