Evidence for a phosphorus-related interfacial defect complex at a GaP/GaNP heterojunction

D. Dagnelund, I. P. Vorona, L. S. Vlasenko, X. J. Wang, A. Utsumi, Y. Furukawa, A. Wakahara, H. Yonezu, I. A. Buyanova, and W. M. Chen
Phys. Rev. B 81, 115334 – Published 31 March 2010

Abstract

Optically detected magnetic resonance (ODMR) studies of molecular beam epitaxial GaNP/GaP structures reveal presence of a P-related complex defect, evident from its resolved hyperfine interaction between an unpaired electronic spin (S=1/2) and a nuclear spin (I=12) of a P31 atom. The principal axis of the defect is concluded to be along a 111 crystallographic direction from angular dependence of the ODMR spectrum, restricting the P atom (either a PGa antisite or a Pi interstitial) and its partner in the complex defect to be oriented along this direction. The principal values of the electronic g tensor and hyperfine interaction tensor are determined as: g=2.013, g=2.002, and A=130×104cm1, A=330×104cm1, respectively. The interface nature of the defect is clearly manifested by the absence of the ODMR lines originating from two out of four equivalent 111 orientations. Defect formation is shown to be facilitated by nitrogen ion bombardment under nonequilibrium growth conditions and the defect is thermally stable upon post-growth thermal annealing.

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  • Received 3 February 2010

DOI:https://doi.org/10.1103/PhysRevB.81.115334

©2010 American Physical Society

Authors & Affiliations

D. Dagnelund1, I. P. Vorona2, L. S. Vlasenko3, X. J. Wang1, A. Utsumi4, Y. Furukawa4, A. Wakahara4, H. Yonezu4, I. A. Buyanova1, and W. M. Chen1

  • 1Department of Physics, Chemistry and Biology, Linköping University, S-581 83 Linköping, Sweden
  • 2Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev 03028, Ukraine
  • 3A. F. Ioffe Physico-Technical Institute, St. Petersburg 194201, Russia
  • 4Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan

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Vol. 81, Iss. 11 — 15 March 2010

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