Approaching the low-temperature limit in nucleation and two-dimensional growth of fcc (100) metal films Ag/Ag(100)

S. Frank, H. Wedler, R. J. Behm, J. Rottler, P. Maass, K. J. Caspersen, C. R. Stoldt, P. A. Thiel, and J. W. Evans
Phys. Rev. B 66, 155435 – Published 31 October 2002
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Abstract

We analyze the formation of two-dimensional Ag islands following deposition of about 0.1 ML of Ag on Ag(100) over a temperature regime ranging from classical nucleation and growth behavior to almost immobile adatoms, from 300 to 125 K. Particular emphasis is placed on the post-deposition dynamics at the lower end of the temperature range, where the saturation island density is not reached at the end of the deposition, and nucleation and aggregation processes continue with adatoms from the remaining adatom gas. Our analysis combines VT scanning tunneling microscopy experiments with kinetic Monte Carlo simulation of appropriate atomistic models. The only adjustable parameters in the model are the terrace diffusion barrier and prefactor, which can be determined from island density behavior near room temperature. Other processes such as rapid edge diffusion, and “easy” nucleation and aggregation of diagonally adjacent adatoms, are treated as instantaneous. The model excellently reproduces all aspects of behavior at low temperatures, demonstrating that nucleation and growth processes can be described in one consistent scheme, down to the regime of almost immobile adatoms.

  • Received 24 June 2002

DOI:https://doi.org/10.1103/PhysRevB.66.155435

©2002 American Physical Society

Authors & Affiliations

S. Frank*, H. Wedler, and R. J. Behm

  • Abteilung Oberflächenchemie und Katalyse, Universität Ulm, D-89069 Ulm

J. Rottler and P. Maass

  • Fachbereich Physik, Universität Konstanz, D-78457 Konstanz, Germany

K. J. Caspersen§, C. R. Stoldt, P. A. Thiel, and J. W. Evans

  • Departments of Chemistry and Mathematics, and Ames Laboratory, Iowa State University, Ames, Iowa 50011

  • *Present address: Abt. Elektrochemie, Univ. Ulm, D-89069 Ulm, Germany.
  • Present address: DaimlerChrysler AG, HPC D203, D-70546 Stuttgart, Germany.
  • Present address: Dept. of Physics and Astronomy, The Johns Hopkins University, 3400 N. Charles Street, Baltimore, Maryland 21218.
  • §Present address: Dept. of Chemistry, University of California, Los Angeles, California 90095-1361.
  • Present address: Dept. of Mechanical Engineering and Materials Science, Univ. of Colorado, Boulder, Colorado 80309.

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Issue

Vol. 66, Iss. 15 — 15 October 2002

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