Electrical and structural properties of nanoscale NiSi2 precipitates in silicon

F. Riedel and W. Schröter
Phys. Rev. B 62, 7150 – Published 15 September 2000
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Abstract

Structurally well-defined NiSi2 platelets of two {111}-silicide lattice planes thickness and 37 nm diameter form after in-diffusion of nickel in n-type silicon at 900 °C followed by rapid quenching. These platelets are bounded by a dislocation ring and exhibit in deep-level-transient-spectroscopy (DLTS) measurements a line that can be attributed to bandlike electronic states at the extended defect. We exploit internal ripening of individual precipitates upon additional annealing at 320 °C in order to study the temporal evolution of their electrical and structural properties. Within a short time of about 1 min one observes a continuous transmutation of DLTS line characteristics, finally revealing localized states at the defect. Structural changes towards a compact shape become observable by means of transmission electron microscopy on a significantly larger time scale of several minutes. We conclude that the bounding dislocation ring determines the electrical activity of platelets as-quenched. Due to its particular core structure, the dislocation exhibits characteristics of a quantum wire. A specific core defect that allows us to construct curved dislocation line segments causes meandering, which has been shown to be the weakest perturbation of ideal one-dimensional behavior.

  • Received 5 May 2000

DOI:https://doi.org/10.1103/PhysRevB.62.7150

©2000 American Physical Society

Authors & Affiliations

F. Riedel* and W. Schröter

  • Georg-August-Universität Göttingen, IV. Physikalisches Institut, Bunsenstrasse 13-15, D-37073 Göttingen, Germany

  • *Corresponding author. Email: riedel@ph4.physik.uni-goettingen.de, FAX: +49-551-394574.

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Vol. 62, Iss. 11 — 15 September 2000

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