Spin-valve effects in a semiconductor field-effect transistor: A spintronic device

S. Gardelis, C. G. Smith, C. H. W. Barnes, E. H. Linfield, and D. A. Ritchie
Phys. Rev. B 60, 7764 – Published 15 September 1999
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Abstract

We present a spintronic semiconductor field-effect transistor. The injector and collector contacts of this device were made from magnetic permalloy thin films with different coercive fields so that they could be magnetized either parallel or antiparallel to each other in different applied magnetic fields. The conducting medium was a two-dimensional electron gas (2DEG) formed in an AlSb/InAs quantum well. Data from this device suggest that its resistance is controlled by two different types of spin-valve effect: the first occurring at the ferromagnet-2DEG interfaces; and the second occurring in direct propagation between contacts.

  • Received 21 May 1999

DOI:https://doi.org/10.1103/PhysRevB.60.7764

©1999 American Physical Society

Authors & Affiliations

S. Gardelis, C. G. Smith, C. H. W. Barnes, E. H. Linfield, and D. A. Ritchie

  • Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge CB3 0HE, United Kingdom

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Vol. 60, Iss. 11 — 15 September 1999

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