Theory of phosphorus doping in aSi:H

P. A. Fedders
Phys. Rev. B 58, 7020 – Published 15 September 1998
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Abstract

For a long time the rather low doping efficiency of P and B in aSi:H has been explained by the argument that almost all of both is incorporated into threefold-coordinated sites, and that both are inert or nondoping in this configuration. Recently, using ab initio molecular dynamics, the energetics and electronic structure (doping) consequences of B incorporation into aSi:H both with and without H passivation were studied. This work showed that the conventional view was in error and that the low doping efficiency in B is primarily due to H passivation. In this paper we similarly study P incorporation on aSi:H both with and without passivation. We obtain quantitative results on the energetics and electronic structure of P atoms in aSi:H. In this case, the results do support the conventional view. Thus P and B act very differently in aSi:H. However, we also find that the P-H complexes that passivate P in crystalline Si are not even metastable in aSi:H.

  • Received 15 April 1998

DOI:https://doi.org/10.1103/PhysRevB.58.7020

©1998 American Physical Society

Authors & Affiliations

P. A. Fedders

  • Department of Physics, Washington University, St. Louis, Missouri 63130

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Vol. 58, Iss. 11 — 15 September 1998

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