Spin-integrated and spin-resolved photoemission study of Fe chalcogenides

K. Shimada, T. Mizokawa, K. Mamiya, T. Saitoh, A. Fujimori, K. Ono, A. Kakizaki, T. Ishii, M. Shirai, and T. Kamimura
Phys. Rev. B 57, 8845 – Published 15 April 1998
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Abstract

The electronic structures of the antiferromagnetic semiconductor FeS and ferrimagnetic metals Fe7S8 and Fe7Se8 have been studied by spin-integrated and spin-resolved photoemission spectroscopy and inverse-photoemission spectroscopy. The overall Fe 3d bandwidth in the photoemission spectra is 25–30 % narrower than the density of states (DOS) predicted by first-principles band-structure calculations and is accompanied by an intense tail on the high-binding-energy side, indicating the correlated nature of electrons in the Fe 3d band. Deviation from the band DOS is more significant in Fe7S8 than in Fe7Se8, and in the minority-spin spectra than in the majority-spin spectra. Cluster-model calculation for FeS has shown satellite structures at high binding energies, but the calculated spectral line shape is not in good agreement with experiment compared to the band DOS. By introducing a self-energy correction to the band DOS, we could explain the narrowing of the overall Fe 3d bandwidth and the high-binding-energy tail shape but not for the unusual broadening of the Fe 3d band within 1eV of the Fermi level.

  • Received 19 February 1997

DOI:https://doi.org/10.1103/PhysRevB.57.8845

©1998 American Physical Society

Authors & Affiliations

K. Shimada*, T. Mizokawa, K. Mamiya, T. Saitoh, and A. Fujimori

  • Department of Physics, University of Tokyo, Bunkyo-ku, Tokyo 113, Japan

K. Ono, A. Kakizaki, and T. Ishii

  • Institute for Solid State Physics, University of Tokyo, Tokyo 106, Japan

M. Shirai

  • Department of Material Physics, Osaka University, Toyonaka, Osaka 560, Japan

T. Kamimura

  • Department of Physics, Tohoku University, Sendai 980-77, Japan

  • *Present address: Hiroshima Synchrotron Radiation Center, Hiroshima University, Higashi-Hiroshima 739, Japan.
  • Present address: Department of Applied Chemistry, University of Tokyo, Tokyo 113, Japan.

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Vol. 57, Iss. 15 — 15 April 1998

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