dc conductivity of arsenic-doped silicon near the metal-insulator transition

W. N. Shafarman, D. W. Koon, and T. G. Castner
Phys. Rev. B 40, 1216 – Published 15 July 1989
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Abstract

dc conductivity measurements have been made on uncompensated Si:As in the concentration range 6.85×1018018R cm3 for 0.5<T<77 K, although three samples were studied in a dilution refrigerator. Insulating samples exhibited variable-range hopping (VRH) behavior of the form σ(T)=σ0(1/T)s exp[-(T0/T)p] for 0.86NcNc for T<8 K. The most satisfactory overall fit to the data is p∼(1/4 and s∼0, namely Mott VRH. A new criterion is given to decide the temperature regimes where Mott or Efros-Shklovskii VRH (p=(1/2) should be observed. The characteristic Mott temperature T0∝(1-N/Nc)3ν yielded 0.77<ν<0.97. Strong deviations from VRH behavior were observed for N<0.84Nc. Metallic samples showed a σ(n,T)=σ(n,0)+m(n)T1/2 dependence at sufficiently low temperatures. The results yield σ(n,0)=σ0(n/nc1)μ with σ0=376 S/cm, 8.55<nc<8.60×1018 cm3, and μ=0.60±0.05. The coefficient m(n) shows behavior similar to that for Si:P, but shows a second sign crossing for n/nc∼2.4. The m(n) results seem to confirm the dominance of the Hartree interaction for the many-valley case.

  • Received 31 October 1988

DOI:https://doi.org/10.1103/PhysRevB.40.1216

©1989 American Physical Society

Authors & Affiliations

W. N. Shafarman, D. W. Koon, and T. G. Castner

  • Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627-0011

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Issue

Vol. 40, Iss. 2 — 15 July 1989

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