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Pressure-induced bond-angle variation in amorphous SiO2

R. A. B. Devine, R. Dupree, I. Farnan, and J. J. Capponi
Phys. Rev. B 35, 2560(R) – Published 15 February 1987
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Abstract

Magic-angle spinning nuclear magnetic resonance measurements have been performed on Si29 nuclei in amorphous silica before and after densification ∼16% by pressure compaction at 50 kbar and 600?deC. The pressure-induced shift in the SiOSi bond-angle distribution maximum from 143° to 138° is consistent with results obtained from x-ray scattering and Raman spectroscopy. Variation in the bond-angle distribution is discussed in terms of recent models for the structure of amorphous SiO2. It is concluded that the important parameter modified by densification is the oxygensecond-nearest-neighbor-oxygen smallest distance of approach. This in turn leads to a variation in the nature of the short-range order.

  • Received 8 October 1986

DOI:https://doi.org/10.1103/PhysRevB.35.2560

©1987 American Physical Society

Authors & Affiliations

R. A. B. Devine

  • Centre National d’Etudes des Télécommunications, BP?, 38243 Meylan, France

R. Dupree and I. Farnan

  • Physics Department, University of Warwick, Coventry CV4?L, United Kingdom

J. J. Capponi

  • Laboratoire de Cristallographie, Centre National de la Recherche Scientific BP?6, 38041 Grenoble, France

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Issue

Vol. 35, Iss. 5 — 15 February 1987

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