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Spectroscopy for identification of plasma sources for lithography and water window imaging

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, , Citation Gerry O'Sullivan et al 2015 J. Phys.: Conf. Ser. 635 092037 DOI 10.1088/1742-6596/635/9/092037

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gerry.osullivan@ucd.ie

Author affiliations

1 School of Physics, University College Dublin Belfield, Dublin 4, Ireland

2 Department of Advanced Interdisciplinary Science and Center for Optical Research (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 Japan

3 School of Nuclear Science and Technology, Lanzhou University, Lanzhou, 730000, China

4 Graduate School of Science and Engineering for Research, University of Toyama, Toyama, Toyama 930-8555, Japan

5 National Institute for Fusion Science, 322-6 Oroshi-cho, Toki, Gifu 509-5292, Japan

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1742-6596/635/9/092037

Synopsis

We report on the result of an extensive study of the extreme ultraviolet (EUV) and soft x-ray spectra from laser produced plasmas of a number of medium and high Z metals undertaken to identify potential sources for use with multilayer mirrors as sources for lithography and water window imaging and cell tomography.

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10.1088/1742-6596/635/9/092037