Structure and magnetic properties of electrodeposited Ni films on n-GaAs(001)

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Published 15 November 2002 • Published under licence by IOP Publishing Ltd
, , Citation C Scheck et al 2002 J. Phys.: Condens. Matter 14 12329 DOI 10.1088/0953-8984/14/47/308

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1 Center for Materials for Information Technology, University of Alabama, Box 870209, Tuscaloosa, AL 35487, USA

2 Department of Physics and Astronomy, University of Alabama, Box 870324, Tuscaloosa, AL 35487, USA

3 Department of Metallurgical and Materials Engineering, Box 870202, University of Alabama, Tuscaloosa, AL 35487, USA

4 Department of Physics, Auburn University, Auburn, AL 36849, USA

5 Space Research Institute, 231 Leach Science Center, Auburn University, Auburn, AL 36849, USA

Dates

  1. Received 21 May 2002
  2. Published

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0953-8984/14/47/12329

Abstract

We report the structural and magnetic properties of Ni films grown on GaAs(001) using electrodeposition, covering the thickness range 0–80 nm. The structure is characterized by mixed (001) and (011) epitaxial orientation of fcc Ni with a preference for the Ni(001) orientation. The magnetic anisotropy is originated by a combination of a crystalline contribution with fourfold symmetry and a uniaxial anisotropy probably caused by the asymmetry in the substrate surface structure. The saturation magnetic moment varies linearly with thickness, indicating limited intermixing between Ni film and GaAs substrate. This is ascribed to the low-energy deposition process characteristic of electrodeposition.

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10.1088/0953-8984/14/47/308