Abstract
In measurements of low contact resistances in planar geometries, the current density through the contact can be inhomogeneous. If this inhomogeneity is neglected, serious systematic errors can occur when calculating the specific contact resistivity. In this work, the transmission line model, commonly used in semiconductor technology, is applied to account for the inhomogeneous current density in low ohmic contacts between gold or silver and YBa2Cu3O7 thin films. To evaluate the influence of preparation parameters, several fabrication techniques and different kinds of YBa2Cu3O7 thin films have been used to form the metal-YBa2Cu3O7 interface. Contact resistivities as low as 1*10-9 Omega cm2 have been obtained.
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