Use of helium flush in the vacuum deposition of thin films

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, , Citation G N Srivastava and G D Scott 1961 Br. J. Appl. Phys. 12 255 DOI 10.1088/0508-3443/12/5/311

0508-3443/12/5/255

Abstract

Silver films deposited in a vacuum chamber previously flushed with an inert gas, helium, exhibit less aggregation as shown in electron micrographs and reduced ageing as determined from electrical conductivity, as compared with films produced under the usual high vacuum procedures. It is concluded that in general flushing the vacuum chamber with helium is of value in producing stable, compact and pure evaporated films.

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10.1088/0508-3443/12/5/311