UV written reflection grating structures in photosensitive optical fibres using phase-shifted phase masks
UV written reflection grating structures in photosensitive optical fibres using phase-shifted phase masks
- Author(s): R. Kashyap ; P.F. Mckee ; D. Armes
- DOI: 10.1049/el:19941357
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- Author(s): R. Kashyap 1 ; P.F. Mckee 1 ; D. Armes 1
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View affiliations
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Affiliations:
1: BT Laboratories, Ipswich
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Affiliations:
1: BT Laboratories, Ipswich
- Source:
Volume 30, Issue 23,
10 November 1994,
p.
1977 – 1978
DOI: 10.1049/el:19941357 , Print ISSN 0013-5194, Online ISSN 1350-911X
Reflection grating structures have been replicated in photosensitive optical fibres using phase shifted phase masks for the first time. The sensitivity of the narrow bandpass peak to alignment and position of the phase shift are reported.
Inspec keywords: light interferometry; optical fibres; phase shifting masks; optical fibre fabrication; diffraction gratings
Other keywords:
Subjects: Gratings, echelles; Fibre optics; Optical fibre fabrication, cladding, splicing, joining; Other fibre optical devices and techniques
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