Low threshold Nd-doped silica planar waveguide laser
Low threshold Nd-doped silica planar waveguide laser
- Author(s): J.R. Bonar ; J.A. Bebbington ; J.S. Aitchison ; G.D. Maxwell ; B.J. Ainslie
- DOI: 10.1049/el:19940190
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- Author(s): J.R. Bonar 1 ; J.A. Bebbington 1 ; J.S. Aitchison 1 ; G.D. Maxwell 2 ; B.J. Ainslie 2
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View affiliations
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Affiliations:
1: Department of Electronics and Electrical Engineering, University of Glasgow, Glasgow, United Kingdom
2: Department of Electronics and Electrical Engineering, BT Laboratories, Ipswich, United Kingdom
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Affiliations:
1: Department of Electronics and Electrical Engineering, University of Glasgow, Glasgow, United Kingdom
- Source:
Volume 30, Issue 3,
3 February 1994,
p.
229 – 230
DOI: 10.1049/el:19940190 , Print ISSN 0013-5194, Online ISSN 1350-911X
The authors report high power, high slope efficiency, Nd-doped glass waveguide lasers on Si, fabricated by flame hydrolysis deposition (FHD) and reactive ion etching (RIE). The laser was pumped at 804 nm and achieved a lasing threshold of 20 mW, slope efficiencies of 2.6 % and output powers of over 1 mW.
Inspec keywords: integrated optics; optical workshop techniques; neodymium; sputter etching; solid lasers; chemical vapour deposition; optical waveguides
Other keywords:
Subjects: Lasing action in other solids; Optical waveguides; Optical fabrication, surface grinding; Integrated optics; Design of specific laser systems; Optical waveguides and couplers; Solid lasers; Integrated optics
References
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